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Yusuke Hirayama
Yusuke Hirayama
Electronic engineering
Ion implantation
Dopant
Atomic radius
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Balanced electron drift oxide etcher with Xe added gas chemistry for low cost and high performance contact metallization
1999
VLSIT | Symposium on VLSI Technology
H. Komeda
Masaki Hirayama
Yusuke Hirayama
Kazuhide Ino
Ryu Kaihara
Tadahiro Ohmi
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