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Koutaro Endo
Koutaro Endo
Materials science
Polymer
Photochemistry
Resist
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5
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1
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Fluorine Containing Acryl Copolymer
2017
Toshiyuki Ogata
Koutaro Endo
Hiroshi Komano
Toshimasa Nakayama
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ノルボルネン系ポリマー、その組成物、及び該組成物を使用するリソグラフィ法
2006
Tomoyuki Ando
Chun Chang
Koutaro Endo
Keita Ishizuka
Pramod Kandanarachchi
Larry F. Rhodes
Larry Seger
tyan tyun
kandanarasiti puramoddo
efu . roozu rarii
siigaa rarii
tomoyuki andou
keita isizuka
koutarou endou
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Investigation of Resist Characteristics of Fluoropolymer for 157nm Lithography.
2002
Journal of Photopolymer Science and Technology
Toshiyuki Ogata
Koutaro Endo
Hiromitsu Tsuji
Hiroshi Komano
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New polymer for 157-nm single-layer resist based on fluorine-containing acryl copolymer
2001
Toshiyuki Ogata
Koutaro Endo
Hiroshi Komano
Toshimasa Nakayama
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Wernicke's Encephalopathy after Glucose Infusion Symposium Problems in Medical Care based on the Health Insurance System
1994
Niigata medical journal
Masami Tanaka
Kazuo Suzuki
Koutaro Endo
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