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Jae-jong Han

Samsung

9

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35

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Selective Epitaxial Growth of Silicon for Vertical Diode Application

2010 Japanese Journal of Applied Physics
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Selective Epitaxial Growth of Silicon Layer Using Batch-Type Equipment for Vertical Diode Application to Next Generation Memories

2010
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Development and Optimization of Re-Oxidized Tunnel Oxide with Nitrogen Incorporation for the Flash Memory Applications

2007 IRPS | International Reliability Physics Symposium
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Study on the characteristics of SiO2 films prepared by hydrogen-assisted low-pressure radical oxidation using batch-type equipment with a 100-wafers of 300-mm-diameter capability

2006 Journal of the Korean Physical Society
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