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Timothy N. Camenzind
Timothy N. Camenzind
University of Basel
Physics
Graphene
Plasma
Isotropic etching
Bilayer graphene
5
Papers
12
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Mobility limiting factors in Si-MOSFETs fabricated with a full CMOS process
2021
Bulletin of the American Physical Society
Timothy N. Camenzind
Asser Elsayed
Bogdan Govoreanu
Stefan Kubicek
Iuliana Radu
Dominik M. Zumbühl
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High mobility SiMOSFETs fabricated in a full 300mm CMOS process
2021
arXiv: Mesoscale and Nanoscale Physics
Timothy N. Camenzind
Asser Elsayed
Fahd A. Mohiyaddin
R. Li
Stefan Kubicek
J. Jussot
Pol Van Dorpe
Bogdan Govoreanu
Iuliana Radu
Dominik M. Zumbühl
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Anisotropic etching of graphite and graphene in a remote hydrogen plasma
2017
arXiv: Mesoscale and Nanoscale Physics
Dorothée Hug
Simon Zihlmann
Mirko K. Rehmann
Yemliha Bilal Kalyoncu
Timothy N. Camenzind
L. Marot
Kenji Watanabe
Takashi Taniguchi
D. M. Zumbühl
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Anisotropic Etching of Graphite and Graphene in a Remote Hydrogen Plasma
2017
arXiv: Mesoscale and Nanoscale Physics
Dorothée Hug
Simon Zihlmann
Mirko K. Rehmann
Yemliha B. Kalyoncu
Timothy N. Camenzind
Laurent Marot
Kenji Watanabe
Takashi Taniguchi
Dominik M. Zumbühl
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