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I. Kawanabe

Tohoku University

6

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165

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Particle deposition and removal in wet cleaning processes for ULSI manufacturing

1992 IEEE Transactions on Semiconductor Manufacturing
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Etching Rate and Mechanism of Doped Oxide in Buffered Hydrogen Fluoride Solution

1992 Journal of The Electrochemical Society
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Principles of wet chemical processing in ULSI microfabrication

1991 IEEE Transactions on Semiconductor Manufacturing
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Wafer dry cleaning using diluted anhydrous hydrogen fluoride gas

1990
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