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Hidetaka Saitoh
Hidetaka Saitoh
Hitachi
Resist
Materials science
Analytical chemistry
Optics
Fabrication
5
Papers
5
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Improvement of the resolution and accuracy of chemical-amplification positive resist for 0.13-μm reticle fabrication
2000
Tadashi Arai
Toshio Sakamizu
Kei Kasuya
Kohji Katoh
Takashi Soga
Hidetaka Saitoh
Hiroshi Shiraishi
Morihisa Hoga
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Improvement of CD accuracy for next-generation reticles using HL-800M and CA resists
1999
Hidetoshi Satoh
Yasunari Sohda
Hidetaka Saitoh
Morihisa Hoga
Suyo Asai
Katsuhiro Kawasaki
Kazui Mizuno
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Chemically amplified positive resist for next-generation photomask fabrication
1999
Kohji Katoh
Kei Kasuya
Tadashi Arai
Toshio Sakamizu
Hidetoshi Satoh
Hidetaka Saitoh
Morihisa Hoga
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Study of development methods for chemical amplification resist
1998
Hidetaka Saitoh
Takashi Soga
Shinji Kubo
S. Sanki
A. M. Hoga
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Development methods for chemical amplification resist
1998
Hidetaka Saitoh
Takashi Soga
Shinji Kubo
Syuichi Sanki
Morihisa Hoga
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