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René Troitsch

Forschungszentrum Jülich

7

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Thermally activated diffusion and lattice relaxation in (Si)GeSn materials

2020 Physical Review Materials
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Thermally activated diffusion and lattice relaxation in (Si)GeSn materials

2020 Physical Review Materials
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Thermal stability and Sn diffusion in GeSn heterostructures

2017
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Ternary and quaternary Ni(Si)Ge(Sn) contact formation for highly strained Ge p- and n-MOSFETs

2015 Semiconductor Science and Technology
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Ni(SiGeSn) Metal Contact Formation on Low Bandgap Strained (Si)Ge(Sn) Semiconductors

2006
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