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Todd Guenther
Todd Guenther
Motorola
Materials science
Exposure latitude
Photoresist
Resist
Extreme ultraviolet lithography
4
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14
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Ultrathin photoresists for 193-nm lithography
2003
Richard D. Peters
Gilles Amblard
Jen-Jiang Lee
Todd Guenther
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Citations (2)
A Study of Atomic Layer Deposition and Reactive Plasma Compatibilitywith Mesoporous Organosilicate Glass Films
2003
E. Todd Ryan
Melissa Freeman
Lynne Svedberg
Jen-Jiang Lee
Todd Guenther
Jim Connor
Katie Yu
J. P. Sun
David W. Gidley
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Citations (6)
Integration damage in organosilicate glass films
2002
IITC | International Interconnect Technology Conference
E.T. Ryan
Jeremy I. Martin
Kurt H. Junker
Jen-Jiang Lee
Todd Guenther
Jeffrey T. Wetzel
S. Lin
David W. Gidley
J. P. Sun
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Citations (4)
Integration of ultrathin resist processes into MPU IC manufacturing flows
2001
Jonathan L. Cobb
Will Conley
Todd Guenther
Fred Huang
Jen-Jiang Lee
Tom Lii
S. Dakshina-Murthy
Colita Parker
Saifi Usmani
Wei Wu
Scott Daniel Hector
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Citations (2)
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