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John Thornell
John Thornell
Rudolph Technologies, Inc.
Metrology
Process control
Electronic engineering
Visual inspection
Wafer
5
Papers
7
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0
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Smart in-line defectivity/metrology process control solution for advanced 3D integration
2016
Amina Sidhoum
Nicolas Devanciard
Franck Bana
Arnaud Garnier
Nicolas Bresson
Sandra Bos
Stephane Rey
Carlos Beitia
Dario Alliata
Darcy Hart
John Thornell
Justin Miller
Gilles Vera
Scott Balak
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Citations (3)
Improving mean time to develop micro-bump/pillar fabrication process for vertical interconnections by combined defectivity and metrology approach
2015
Nicolas Devanciard
Franck Bana
Nicolas Bresson
Stephane Rey
Carlos Beitia
Dario Alliata
Darcy Hart
John Thornell
Justin Miller
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Through silicon via process characterization by integrated inspection/metrology solutions in visible and infrared domain
2015
ASMC | Advanced Semiconductor Manufacturing Conference
Nicolas Devanciard
Stephane Rey
Thomas Magis
Stephane Minoret
Carlos Beitia
Dario Alliata
David S. Marx
Prasad Bachiraju
Darcy Hart
John Thornell
Russ Dudley
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Through Silicon Via Process Characterization by Integrated Inspection/Metrology Solutions in Visible and Infrared Domain Category: AM: Advanced Metrology
2015
Nicolas Devanciard
Stephane Rey
Thomas Magis
Stephane Minoret
Carlos Beitia
Dario Alliata
David Marx
Prasad Bachiraju
John Thornell
Russ Dudley
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Automated Metrology Improves Productivity and Yields for Wafer Level Packaging in High Volume Manufacturing
2014
Jin You Zao
Bong Yin Yen
Lim Beng Kuan
John Thornell
Darcy Hart
David S. Marx
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