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J. Frickinger
J. Frickinger
Fraunhofer Society
Wafer
Engineering
Semiconductor device fabrication
Cleanroom
CMOS
5
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27
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Approach for a Standardized Methodology for Multi-Site Processing of 300mm Wafers at R&D-Sites
2006
ISSM | International Symposium on Semiconductor Manufacturing
Richard Oechsner
J. Frickinger
Markus Pfeffer
Martin Schellenberger
Georg Roeder
Lothar Pfitzner
H. Ryssel
Mike Fritzsche
V. Kaushik
D Renaud
Adrien Danel
C. Claeys
Twan Bearda
M. Lering
M. Graef
B. Murphy
H. Walther
S. Hury
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FLYING WAFER - A STANDARDISED METHODOLOGY FOR MULTI-SITE PROCESSING OF 300 MM WAFERS AT R&D-SITES
2006
IFAC Proceedings Volumes
J. Frickinger
Richard Oechsner
Martin Schellenberger
Markus Pfeffer
Lothar Pfitzner
H. Ryssel
C. Claeys
Martine Claes
Twan Bearda
D Renaud
Adrien Danel
M. Lering
M. Graef
V. Kaushik
B. Murphy
Mike Fritzsche
H. Walther
S. Hury
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FOUP cleaning - FOSB transportation: a challenge for manufacturing on 300 mm wafers
2001
ISSM | International Symposium on Semiconductor Manufacturing
J. Frickinger
Jurgen Bugler
Gerhard Zielonka
H. Ryssel
Hans-Martin Dudenhausen
Mike Fritzsche
Marlin Shopbell
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