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Stanislov Todorov
Stanislov Todorov
Oxygen
Analytical chemistry
Oxide
Ion implantation
Annealing (metallurgy)
1
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5
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RTP requirements to yield uniform and repeatable ultra-shallow junctions with low energy boron and BF 2 ion implants
1998
Journal of Electronic Materials
Steven D. Marcus
Wilfried Lerch
Daniel F. Downey
Stanislov Todorov
Judy W. Chow
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