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Maito Shiraishi
Maito Shiraishi
Materials science
Ion implantation
Photoluminescence
Ion
Optoelectronics
5
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1
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0
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2024
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Determination of Mg acceptor concentration in GaN through photoluminescence
2021
Applied Physics Express
Masato Omori
Taisei Miyazaki
Kenta Watanabe
Maito Shiraishi
Ryusei Wada
Takashi Okawa
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Evaluation of acceptor activation rate of Mg/N-ion-implanted GaN annealed at 1400°C under normal pressure
2021
The Japan Society of Applied Physics
Masato Omori
Kenta Watanabe
Taisei Miyazaki
Maito Shiraishi
Ryusei Wada
Takashi Okawa
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PL characteristics of electron-irradiated and Mg/N-ion-implanted GaN
2021
The Japan Society of Applied Physics
Maito Shiraishi
Taisei Miyazaki
Ryusui Wada
Kenta Watanabe
Takashi Okawa
Masato Omori
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Investigation of activation anneal for selective p-GaN layer.
2020
The Japan Society of Applied Physics
Kenta Watanabe
Hiroko Iguchi
Maito Shiraishi
Taisei Miyazaki
Ryusui Wada
Masato Omori
Takashi Okawa
Yoshitaka Nagasato
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