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Carlo Floresca

University of Texas at Dallas

7

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229

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Scaling of HfO2 dielectric on CVD graphene

2014 Applied Surface Science
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Atomic Layer Deposition of Dielectrics on Graphene Using Reversibly Physisorbed Ozone

2012 ACS Nano
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Void-free filling of spin-on dielectric in 22 nm wide ultrahigh aspect ratio Si trenches

2009 Journal of Vacuum Science & Technology B
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Physical degradation of GaN HEMT devices under high drain bias reliability testing

2009 Microelectronics Reliability
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Citations (84)