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Masaya Komatsu
Masaya Komatsu
LSI Corporation
Reticle
Dry etching
Process capability
Electronic engineering
Engineering
2
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Double Step process for manufacturing reticle to reduce gate CD variation
2001
Makoto Kozuma
Masaya Komatsu
Rieko Arakawa
Seiji Kubo
Tatsuya Takahashi
John V. Jensen
Hyun-Suk Bang
Il-Ho Lee
Cheol Shin
Hong-Seok Kim
K.-W. Park
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Double Step process for manufacturing reticle to reduce gate CD variation
2001
Makoto Kozuma
Masaya Komatsu
Rieko Arakawa
Seiji Kubo
Tatsuya Takahashi
John V. Jensen
Hyun-Suk Bang
Il-Ho Lee
Cheol Shin
Hong-Seok Kim
Keun-Won Park
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1