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P. C. Hoyle
P. C. Hoyle
Dry etching
Isotropic etching
Reactive-ion etching
Thin film
Plasma-enhanced chemical vapor deposition
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Lithography using electron beam induced etching of a carbon film
1995
Journal of Vacuum Science & Technology B
D Wang
P. C. Hoyle
J.R.A. Cleaver
G. A. Porkolab
N. C. MacDonald
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Citations (17)
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