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Christopher J. Funch

University of Oregon

4

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Close-Spaced Vapor Transport Using HCL as Transport Agent - Process Capability Studies for Growth of III-V Films and Devices

2020
- Christopher J. Funch
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Close-spaced vapor transport reactor for III-V growth using HCl as the transport agent

2019 Journal of Crystal Growth
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Water-vapor-mediated close-spaced vapor transport growth of epitaxial gallium indium phosphide films on gallium arsenide substrates

2018
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