author-photo

A. M. Wróbel

Polish Academy of Sciences

47

Papers

994

Citations

Citation Trend

Filter By

Papers (37) Sort By

Journal Conference Others

Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 2. Surface morphology and properties of deposited a-SiC:H films

2014 Thin Solid Films
Show All
- Source
- Cite
- Save
Citations (5)
Hard and High-Temperature-Resistant Silicon Carbonitride Coatings Based on N-Silyl-Substituted Cyclodisilazane Rings

2008 Journal of The Electrochemical Society
Show All
- Source
- Cite
- Save
Citations (19)
Silicon Carbonitride Thin-Film Coatings Fabricated by Remote Hydrogen-Nitrogen Microwave Plasma Chemical Vapor Deposition from a Single-Source Precursor: Growth Process, Structure, and Properties of the Coatings

2007 Journal of Applied Polymer Science
Show All
- Source
- Cite
- Save
Citations (18)
Remote nitrogen microwave plasma chemical vapor deposition from a tetramethyldisilazane precursor. 1. Growth mechanism, structure, and surface morphology of silicon carbonitride films

2006 Thin Solid Films
Show All
- Source
- Cite
- Save
Citations (29)
Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Compositional and structural dependencies of film properties

2006 Diamond and Related Materials
Show All
- Source
- Cite
- Save
Citations (28)
Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Characterization of the process, chemical structure, and surface morphology of the films

2006 Diamond and Related Materials
Show All
- Source
- Cite
- Save
Citations (14)
Silicon carbonitride films produced by remote hydrogen microwave plasma CVD using a (dimethylamino)dimethylsilane precursor

2005 Chemical Vapor Deposition
Show All
- Source
- Cite
- Save
Citations (27)
Silicon Carbonitride Films by Remote Hydrogen-Nitrogen Plasma CVD from a Tetramethyldisilazane Source

2004 Journal of The Electrochemical Society
Show All
- Source
- Cite
- Save
Citations (24)
Remote hydrogen–nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride films

2003 Journal of Materials Chemistry
Show All
- Source
- Cite
- Save
Citations (50)
Remote hydrogen plasma chemical vapor deposition from (dimethylsilyl) (trimethylsilyl)methane. 2. Property-structure relationships for resulting silicon-carbon films

2003 Chemistry of Materials
Show All
- Source
- Cite
- Save
Citations (19)