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Zhi-Xuan Zhang

Xiamen University of Technology

4

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Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO2 Thin Films via Atomic Layer Deposition.

2021 Materials
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In2O3 film prepared by a PEALD process with balanced oxygen radical supply and ion bombardment damage

2021 Vacuum
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Effect of plasma power on the structural properties of tin oxide prepared by plasma-enhanced atomic layer deposition

2020 Ceramics International
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