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U. Baetz
U. Baetz
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Engineering drawing
Cell projection
Data processing
BiCMOS
4
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2
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Optical Proximity Correction for 0.13 micrometer SiGe:C BiCMOS
2011
S. Geisler
J. Bauer
U. Haak
U. Jagdhold
R. Pliquett
E. Matthus
R. Schrader
H. Wolf
U. Baetz
H. Beyer
M. Niehoff
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A solution to meet new challenges on EBDW data prep
2009
R. Galler
D. Melzer
J. Nowotny
K. Kroênert
M. Krueger
M. Suelzle
B. Papenfuss
C Wagner
U. Baetz
B. Buerger
Juergen Gramss
Melchior Lemke
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Latest results and computing performance of the ePLACE data preparation tool
2009
Juergen Gramss
R. Galler
Volker Neick
Arnd Stoeckel
U. Weidenmueller
D. Melzer
M. Suelzle
J. Butschke
U. Baetz
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Optical proximity correction for 0.13 μm SiGe:C BiCMOS
2008
S. Geisler
J. Bauer
U. Haak
U. Jagdhold
R. Pliquett
E. Matthus
R. Schrader
H. Wolf
U. Baetz
H. Beyer
M. Niehoff
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