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hori atusi
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Oxide
Leakage (electronics)
Semiconductor device
Common emitter
Electrode
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大面積集積化に向けたスパッタ堆積ノーマリーオフMoS 2 -nMISFETs
2020
matuura kenta akira
hamada masaya
hamada takuya
tanigawa sei ki
sakamoto takurou
hori atusi
muneda iri ya
kawa na sikou nobu
kaku sima kuniyuki
tutui issyou
ogura atusi
wakabayasi sei
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Method for mfg. semiconductor device
1997
Jingjianyu Ping
tanaka mituo
hori atusi
simomura hirosi
kuchuanliangyan
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a‐Si薄膜越しイオン注入によるバイポーラNPNエミッタの形成方法 (3) 熱処理の低温化やRTAが不純物の活性化に与える影響
1991
segawa mizuki
simomura hirosi
hori atusi
kameyama syuuiti
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a-Si薄膜越しイオン注入によるバイポーラNPNエミッタの形成方法 (3) 熱処理の低温化やRTAが不純物の活性化に与える影響 | 文献情報 | J-GLOBAL 科学技術総合リンクセンター
1991
segawa mizuki
simomura hirosi
hori atusi
kameyama syuuiti
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