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Mark Namaroff
Mark Namaroff
Axcelis Technologies
Electronic engineering
Ion implantation
Annealing (metallurgy)
Materials science
Analytical chemistry
3
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Latest Advances In Ion Implantation & Annealing For Gate And Channel (USJ) Doping Optimization
2007
IWJT | International Workshop on Junction Technology
John Borland
Wade Krull
Masayasu Tanjyo
Mark Namaroff
Andrzej Buczkowski
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SEMICON West executive outlook
2005
David Campbell
R.H. Havemann
Neil Sullivan
Nathan Little
Nick Konidaris
Nick Dawes
Jerry Cutini
R. Keith Lee
Bill Gately
Kurt Lackenbucher
D. Scott Becker
John Odom
George K. Celler
Bret J. Bergman
Steve Chisolm
Bernold Richerzhagen
Mark Namaroff
Rick Hazard
Linda Capuano
Phil Dembowski
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High Energy, High Current Performance of the GSDNHE Implanter for the Production of High Dose P-Type Buried Layers
2000
Journal of Shoulder and Elbow Surgery
Mark Namaroff
Jon Merrill
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