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H Schmidt
H Schmidt
Leibniz Institute of Photonic Technology
Atomic layer deposition
Materials science
Optoelectronics
Analytical chemistry
Detector
4
Papers
25
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A correlation study of layer growth rate, thickness uniformity, stoichiometry, and hydrogen impurity level in HfO2 thin films grown by ALD between 100°C and 350°C
2019
Applied Surface Science
D. Blaschke
Frans Munnik
Jörg Grenzer
Lars Rebohle
H Schmidt
Peter Zahn
Sibylle Gemming
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Citations (8)
Nanowire single-photon detectors made of atomic layer-deposited niobium nitride
2019
Superconductor Science and Technology
Emanuel Knehr
Artem Kuzmin
D. Yu. Vodolazov
Mario Ziegler
Steffen Doerner
Konstantin Ilin
Michael Siegel
Ronny Stolz
H Schmidt
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Citations (7)
Controlled synthesis of self-assembled 3D nanostructures using metastable atomic layer deposition
2018
Materials Today Chemistry
Mario Ziegler
Sezin Yüksel
Sebastian Goerke
Dana Cialla-May
Uwe Hübner
Dong Wang
H Schmidt
Peter Schaaf
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Citations (4)
Hermetic sealing of MEMS including lateral feedthroughs and room-temperature anodic bonding
2018
Journal of Micromechanics and Microengineering
S. Woetzel
Andreas Ihring
E. Kessler
D Franke
Jan Dellith
A. Brown
F. Hänschke
H.-G. Meyer
H Schmidt
Th. Frank
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Citations (6)
1