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D. Schnurbusch
D. Schnurbusch
Resist
Analytical chemistry
Materials science
Nanotechnology
Cathode ray
4
Papers
12
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In situ Characterization of Exposed E-Beam Resist Using Novel AFM Technique
2010
Microscopy and Microanalysis
M Zech
H Koop
K. Karrai
D. Schnurbusch
Alexander W. Holleitner
M. Mueller
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Citations (2)
In situ direct visualization of irradiated electron-beam patterns on unprocessed resists using atomic force microscopy
2010
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
H Koop
M Zech
K. Karrai
D. Schnurbusch
M Müller
Tobias Gründl
Markus-Christian Amann
Alexander W. Holleitner
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Citations (6)
In situ direct visualization of irradiated electron-beam patterns on unprocessed resists using atomic force microscopy
2010
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
H Koop
M Zech
K. Karrai
D. Schnurbusch
Michael Müller
T. Grundl
Markus-Christian Amann
A. Holleitner
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Citations (4)
1