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Rudi De Ruyter
Rudi De Ruyter
IMEC
Wafer
Photomask
Aperture
Resist
Optics
5
Papers
5
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EUV single patterning for logic metal layers: achievement and challenge (Conference Presentation)
2017
Victor M. Blanco Carballo
Stephane Larivière
Rudi De Ruyter
Morin Dehan
G. McIntyre
Ryoung-Han Kim
Werner Gillijns
Ling Ee Tan
Youssef Drissi
Jae Uk Lee
Darko Trivkovic
Paolo A. Gargini
Kurt G. Ronse
Patrick Naulleau
Toshiro Itani
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Through- pitch characterization and printability for 65nm half- pitch alternating aperture phase shift applications
2006
Vicky Philipsen
Leonardus H. A. Leunissen
Rudi De Ruyter
Rik Jonckheere
Patrick M. Martin
Clare Wakefield
Stephen Johnson
Mike Cangemi
Alex Buxbaum
Troy Morrison
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Manufacturability and printability of AAPSM with transparent etch stop layer
2006
Michael Cangemi
Vicky Philipsen
Rudi De Ruyter
Leonardus H. A. Leunissen
Nicolo Morgana
Pierre Sixt
Marc Cangemi
Rand Cottle
Bryan S. Kasprowicz
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Through- pitch characterization and printability for 65nm half- pitch alternating aperture phase shift applications
2006
Vicky Philipsen
Leonardus H. A. Leunissen
Rudi De Ruyter
Rik Jonckheere
Patrick M. Martin
Clare Wakefield
Stephen Johnson
Michael Cangemi
Alex Buxbaum
Troy Morrison
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Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
2005
Vicky Philipsen
Leonardus H. A. Leunissen
Rudi De Ruyter
Rik Jonckheere
Patrick M. Martin
Clare Wakefield
Stephen Johnson
Michael Cangemi
Alex Buxbaum
Troy Morrison
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Citations (3)
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