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Philippe Spinelli
Philippe Spinelli
STMicroelectronics
Leading edge
Metrology
CMOS
Photolithography
Software portability
2
Papers
2
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Investigation of 193-nm resist and plasma interactions during an oxide etching process
2003
B. Mortini
Philippe Spinelli
F. Leverd
Veronique Dejonghe
Richard Braspenning
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Overlay metrology results on leading-edge Cu processes
2002
Vincent Vachellerie
D. Ristoiu
Alain G. Deleporte
Pierre-Olivier Sassoulas
Philippe Spinelli
Marc Poulingue
Pascal Fabre
Rolf Arendt
Ganesh Sundaram
Paul C. Knutrud
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