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Doo Seung Um
Doo Seung Um
Metal gate
Nuclear magnetic resonance
Physics
Inductively coupled plasma
Reactive-ion etching
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Surface Reaction of TaN Metal Gate Etching by Using an Inductively Coupled Plasma
2009
Journal of the Korean Physical Society
Doo Seung Um
Dong-Pyo Kim
Gwan-Ha Kim
Jong Chang Woo
Chang-Il Kim
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