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Ton Kiers

ASML Holding

15

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27

Citations

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Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations

2021
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Investigating process variability at ppm level using advanced massive eBeam CD metrology and contour analysis

2019
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Co-optimization of exposure dose and etch process for SAQP pitch walk control

2018
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SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

2017 Proceedings of SPIE
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CD-SEM distortion quantification for EPE metrology and contour analysis

2017 Proceedings of SPIE
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Robust 2D patterns process variability assessment using CD-SEM contour extraction offline metrology

2017 Proceedings of SPIE
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Translation of lithography variability into after-etch performance: monitoring of golden hotspot

2016
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Application of optical CD for characterization of 70nm dense lines

2005
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Total test repeatability: a new figure of merit for CD metrology tools

2004
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Reticle error correction for lithography tool qualification benefits and limitations

2001
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