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Gerhard Bast
Gerhard Bast
KLA-Tencor
Engineering
Electronic engineering
Wafer
Epitaxy
Light scattering
8
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10
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Bare wafer analysis for wet cleaning efficiency — The impact of classification and sensitivity
2018
ASMC | Advanced Semiconductor Manufacturing Conference
Kay Wendt
Fabian Wilbers
Jochen Ruth
Christophe Lorant
Frank Holsteyns
John Newby
Gerhard Bast
Vignesh Sundar
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Enabling GeH4-HCl in-situ pre-epi clean: impact of water quality on HF last process performance
2015
Kurt Wostyn
Dirk Rondas
Roger Loo
Sathish Kumar Dhayalan
Andriy Hikavyy
Wim Elskens
Alex Vyncke
Paul Mertens
Frank Holsteyns
Stefan De Gendt
Toru Masaoka
Yukifumi Yoshida
Gerhard Bast
Gavin Simpson
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Evaluating SiGe-on-Si epitaxial quality by inline surface light scattering: a case study on the impact of interfacial oxygen
2014
Kurt Wostyn
Karine Kenis
Dirk Rondas
Roger Loo
Andriy Hikavyy
Bastien Douhard
Paul Mertens
Frank Holsteyns
Stefan De Gendt
Gavin Simpson
Gerhard Bast
Karthik Swaminathan
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Defect inspection challenges and solutions for ultra-thin SOI
2012
ASMC | Advanced Semiconductor Manufacturing Conference
Roland Brun
Cécile Moulin
Walter Schwarzenbach
Gerhard Bast
Victor Aristov
Alexander Belyaev
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The use of high resolution haze for control of SOI surface roughness in a volume production environment.
2010
SOI | International SOI Conference
Roland Brun
Cécile Moulin
Gerhard Bast
Gavin Simpson
P. Dighe
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