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Kozue Tomiyama
Kozue Tomiyama
Optics
Analytical chemistry
Optoelectronics
Refractive index
Surface finish
4
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17
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Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography
1999
Nobuhiko Fukuhara
Takashi Haraguchi
Koichiro Kanayama
Tadashi Matsuo
Susumu Takeuchi
Kozue Tomiyama
Tadashi Saga
Yusuke Hattori
Takashi Ooshima
Masao Otaki
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