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Marco Ahrens

Infineon Technologies

5

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Lithography mask for imaging convexes

2003
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Full-level alternating PSM for sub-100nm DRAM gate patterning

2003
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Introduction of full-level alternating phase-shift mask technology into IC manufacturing

2002
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A process for patterning a resist

2001
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OPC method for generating corrected patterns for a phase shifting mask and the trim mask, and associated apparatus and integrated circuit structure

2000
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