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K. Morrisseau
K. Morrisseau
IBM
Analytical chemistry
Copper
Electronic engineering
CMOS
Engineering
2
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37
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High-current characterization of dual-damascene copper interconnects in SiO/sub 2/- and low-k interlevel dielectrics for advanced CMOS semiconductor technologies
1999
IRPS | International Reliability Physics Symposium
Steven H. Voldman
Robert J. Gauthier
K. Morrisseau
Michael J. Hargrove
Vincent J. McGahay
Vaughn P. Gross
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Citations (9)
High-current transmission line pulse characterization of aluminum and copper interconnects for advanced CMOS semiconductor technologies
1998
IRPS | International Reliability Physics Symposium
Steven H. Voldman
Robert J. Gauthier
D. Reinhart
K. Morrisseau
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Citations (28)
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