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Kenji Honda
Kenji Honda
Samsung
Polymer
Photoresist
Resist
Organic chemistry
Materials science
3
Papers
2
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Fluorocarbon-based single-layer resist for 157-nm lithography
2002
Ki Yong Song
Kwang Sub Yoon
Sang-Jun Choi
Sang Gyun Woo
Woo Sung Han
Jae-Jun Lee
Sang Kyun Lee
Chang Ho Noh
Kenji Honda
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Novel alicyclic polymers having 7,7-dimethyloxepan-2-one acid labile groups for ArF lithography
2002
Jae Jun Lee
Jin Baek Kim
Kenji Honda
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Novel deep UV photoresist with thermally crosslinkable photoacid generator
2001
Chang Ho Noh
Sang Kyun Lee
Bongsuk Moon
Kenji Honda
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