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Ichirou Honma

NEC

5

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55

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The parallel processing of EGS4 code on distributed memory scalar parallel computer:Intel Paragon XP/S15-256

1996
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Reactive Ion Etching of GalnP, GaAs, and AIGaAs

1995
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Influence of Water Adsorption/Desorption Processes on the Selectivity of Vapor HF Etching

1995 Journal of The Electrochemical Society
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Selective Etching of Phosphosilicate Glass with Low Pressure Vapor HF

1995 Journal of The Electrochemical Society
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Hemispherical grained Si formation on in-situ phosphorus doped amorphous-Si electrode for 256 Mb DRAM's capacitor

1995 IEEE Transactions on Electron Devices
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