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Chi-Yun Cheng
Chi-Yun Cheng
National University of Kaohsiung
High-κ dielectric
Electronic engineering
Annealing (metallurgy)
Oxygen
Materials science
5
Papers
20
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Reliability Improvement of 28-nm High- $k$ /Metal Gate-Last MOSFET Using Appropriate Oxygen Annealing
2012
IEEE Electron Device Letters
Yi-Lin Yang
Wenqi Zhang
Chi-Yun Cheng
Yi-Ping Huang
Pin-Tseng Chen
Chia-Wei Hsu
Li-Kong Chin
Chien-Ting Lin
Che Hua Hsu
Chien-Ming Lai
Wen-Kuan Yeh
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Citations (19)
The Improvement of Reliability of High-k/Metal Gate pMOSFET Device with Various PMA Conditions
2012
Active and Passive Electronic Components
Yi-Lin Yang
Wenqi Zhang
Chi-Yun Cheng
Wen-Kuan Yeh
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Reliability Improvement of 28nm High-k/Metal Gate Device by Using Oxygen Annealing
2012
Yi-Lin Yang
Wenqi Zhang
Chi-Yun Cheng
Yi-Ping Huang
Pin-Tseng Chen
Li-Kong Chin
Chia-Wei Hsu
Wen-Kuan Yeh
yangyilin
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A proposed high manufacturability strain technology for high-k/metal gate SiGe-SOI CMOSFET
2011
SOI | International SOI Conference
Wen-Kuan Yeh
Chi-Yun Cheng
Yi-Lin Yang
C. T. Lin
C. M. Lai
Y. W. Chen
C H Hsu
C.W. Yang
Po-Ying Chen
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The Improvement of Reliability of 28nm High-k/Metal Gate Device with Various PMA Conditions
2011
Chi-Yun Cheng
Wen-Kuan Yeh
Yi-Lin Yang
Chia-Wei Hsu
yangyilin
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