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Brian H. Thomas
Brian H. Thomas
Clemson University
Polymer
Polymerization
Monomer
Resist
Chemistry
6
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73
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Self-emulsifying polymerization (SEP) of 3,6-dioxa-Δ7-4-trifluoromethyl perfluorooctyl trifluoromethyl sulfonimide with tetrafluoroethylene
2005
Journal of Fluorine Chemistry
Brian H. Thomas
Darryl D. DesMarteau
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Citations (5)
Synthesis of 3,6-dioxa-Δ7-4-trifluoromethyl perfluorooctyl trifluoromethyl sulfonimide: bis[(perfluoroalkyl)sulfonyl] superacid monomer and polymer
2004
Journal of Fluorine Chemistry
Brian H. Thomas
Gregory Shafer
Jing-Ji Ma
Ming-Hu Tu
Darryl D. DesMarteau
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Citations (37)
Resist materials for 157 nm microlithography: An update
2001
Raymond J. Hung
Hoang V. Tran
Brian C. Trinque
Takashi Chiba
Shintaro Yamada
Daniel P. Sanders
Eric F. Connor
Robert H. Grubbs
John M. Klopp
Jean M. J. Fréchet
Brian H. Thomas
Gregory John Shafer
Darryl D. DesMarteau
Will Conley
C. Grant Willson
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