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N. Van Hoornick
N. Van Hoornick
Katholieke Universiteit Leuven
Analytical chemistry
Chemistry
Dielectric
Electronic engineering
Thin film
6
Papers
131
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Nucleation and Growth Behavior of Atomic Layer Deposited HfO2 Films on Silicon Oxide Starting Surfaces
2006
Journal of The Electrochemical Society
Laura Nyns
Lindsey H. Hall
T. Conard
Annelies Delabie
W. Deweerd
M. Heyns
S. Van Elshocht
N. Van Hoornick
Christiaan Vinckier
S. De Gendt
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Citations (23)
Estimation of fixed charge densities in hafnium-silicate gate dielectrics
2006
IEEE Transactions on Electron Devices
Vidya Kaushik
Barry O'Sullivan
Geoffrey Pourtois
N. Van Hoornick
Annelies Delabie
S. Van Elshocht
W. Deweerd
T. Schram
L. Pantisano
E. Rohr
L.-A. Ragnarsson
S. De Gendt
M. Heyns
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Citations (57)
Device performance of transistors with high-/spl kappa/ dielectrics using cross-wafer-scaled interface-layer thickness
2006
IEEE Electron Device Letters
B.J. O'Sullivan
Vidya Kaushik
L.-A. Ragnarsson
B. Onsia
N. Van Hoornick
E. Rohr
S. DeGendt
M. Heyns
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Citations (15)
Sustainable treatment of HF wastewaters from semiconductor industry with a fluidized bed reactor
2003
ISSM | International Symposium on Semiconductor Manufacturing
K Van den Broeck
N. Van Hoornick
J. Van Hoeymissen
R. de Boer
A. Giesen
D. Wilms
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Citations (25)
Electrocoagulation as a viable technique to treat (Cu-)CMP wastes
2000
ISSM | International Symposium on Semiconductor Manufacturing
J. Van Hoeymissen
K Van den Broeck
N. Van Hoornick
M. Heyns
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Citations (2)
1