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Chungwei Michael Hsu
Chungwei Michael Hsu
ASML Holding
Engineering
Electronic engineering
Critical dimension
Proximity effect (audio)
Lithography
5
Papers
52
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Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL)
2002
Chungwei Michael Hsu
Ronfu Chu
J. Fung Chen
Douglas Van Den Broeke
Xuelong Shi
Stephen Hsu
Troy Wang
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Citations (3)
Understanding the forbidden pitch and assist feature placement
2002
Xuelong Shi
Stephen Hsu
J. Fung Chen
Chungwei Michael Hsu
Robert John Socha
Mircea Dusa
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Citations (7)
Understanding the forbidden pitch phenomenon and assist feature placement
2002
Xuelong Shi
Stephen Hsu
J. Fung Chen
Chungwei Michael Hsu
Robert John Socha
Mircea Dusa
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Citations (29)
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
2002
Stephen Hsu
Noel Corcoran
Mark Eurlings
William T. Knose
Thomas Laidig
Kurt E. Wampler
Sabita Roy
Xuelong Shi
Chungwei Michael Hsu
J. Fung Chen
Jo Finders
Robert John Socha
Mircea Dusa
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Citations (13)
RuMBa: a rule-model OPC for low MEEF 130-nm KrF lithography
2001
Stephen Hsu
Xuelong Shi
Chungwei Michael Hsu
Noel Corcoran
J. Fung Chen
Sunil Desai
Micheal J. Sherrill
Y. C. Tseng
Hsien-Min Chang
J. F. Kao
Alex Tseng
WeiJyh Liu
Anseime Chen
Arthur Lin
Jan Pieter Kujten
Eric Jacobs
Arjan Verhappen
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