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Jong Gul Doh
Jong Gul Doh
Samsung
Photolithography
Engineering
Selectivity
Immersion lithography
Photoresist
2
Papers
2
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0
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Study of mask structure for 45-nm node based on manufacturability and lithographic performance
2007
Jong Gul Doh
Cheol-hong Park
Yong Seung Moon
Bo-hye Kim
Sung Won Kwon
Sun-young Choi
Sung Hyuck Kim
Seong-Yoon Kim
Byung Gook Kim
Sang Gyun Woo
Han-Ku Cho
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Feasibility study of mask fabrication in double exposure technology
2006
Jong Gul Doh
Sang-Hee Lee
Je Bum Yoon
Doo-Youl Lee
Seong Yong Cho
Byung Gook Kim
Seong Woon Choi
Woo Sung Han
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Citations (2)
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