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David A. White
David A. White
Massachusetts Institute of Technology
Principal component analysis
Analytical chemistry
Electronic engineering
Materials science
Plasma etching
2
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92
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Low open-area endpoint detection using a PCA-based T/sup 2/ statistic and Q statistic on optical emission spectroscopy measurements
2000
IEEE Transactions on Semiconductor Manufacturing
David A. White
Brian E. Goodlin
Aaron E. Gower
Duane S. Boning
Han Chen
Herbert H. Sawin
Timothy J. Dalton
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Citations (45)
Spatial characterization of wafer state using principal component analysis of optical emission spectra in plasma etch
1997
IEEE Transactions on Semiconductor Manufacturing
David A. White
Duane S. Boning
Stephanie Watts Butler
Gabriel G. Barna
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Citations (47)
1