author-photo

Ki-Seon Kim

Tohoku University

9

Papers

154

Citations

Citation Trend

Filter By

Papers (7) Sort By

Journal Conference Others

A novel doping technology for ultra-shallow junction fabrication: boron diffusion from boron-adsorbed layer by rapid thermal annealing☆

2000 Thin Solid Films
Show All
- Source
- Cite
- Save
Citations (18)
Real-time monitoring of the Si carbonization process by a combined method of reflection high-energy electron diffraction and Auger electron spectroscopy

1999 Applied Physics Letters
Show All
- Source
- Cite
- Save
Citations (19)
RHEED-AES observation of In desorption on a single-domain Si(001)-(1×2) surface

1998 Surface Science
Show All
- Source
- Cite
- Save
Citations (7)
RHEED-AES observation of Sb surface segregation during Sb-mediated Si MBE on Si(0 0 1)

1998 Journal of Crystal Growth
Show All
- Source
- Cite
- Save
Citations (17)
RHEED-AES Observation of Sb Desorption on a Single-Domain Si(001)2×1 Surface

1997 Hyomen Kagaku
Show All
- Source
- Cite
- Save
Citations (0)
RHEED-AES Observation of Sb Desorption on a Single-Domain Si(001)2×1 Surface (第16回表面科学講演大会論文特集2)

1997
Show All
- Source
- Cite
- Save
Citations (0)
Reflection High Energy Electron Diffraction and Auger Electron Spectroscopy (RHEED-AES) Observation of Bi Desorption from a Single-Domain Si(001)2×1-Bi Surface

1996 Japanese Journal of Applied Physics
Show All
- Source
- Cite
- Save
Citations (3)