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Xuefeng Hua

University of Maryland, College Park

32

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622

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Expression of Cyr61 protein and p53 protein in gallbladder carcinoma and their correlation with pathological features

2019 Chinese journal of experimental surgery
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Influence of C4F8/Ar-based etching and H2-based remote plasma ashing processes on ultralow k materials modifications

2010 Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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Mechanistic study of ultralow k-compatible carbon dioxide in situ photoresist ashing processes. II. Interaction with preceding fluorocarbon plasma ultralow k etching processes

2010 Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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Studies of fluorocarbon film deposition and its correlation with etched trench sidewall angle by employing a gap structure using C4F8∕Ar and CF4∕H2 based capacitively coupled plasmas

2008 Journal of Vacuum Science & Technology B
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Evolution of Roughness and Wavelength Selection during Fluorocarbon Plasma Etching of Nanoporous Silica

2006 Bulletin of the American Physical Society
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Studies of plasma surface interactions during short time plasma etching of 193 and 248nm photoresist materials

2006 Journal of Vacuum Science & Technology B
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Damage of ultralow k materials during photoresist mask stripping process

2006 Journal of Vacuum Science & Technology B
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Plasma-surface interactions of nanoporous silica during plasma-based pattern transfer using C4F8 and C4F8∕Ar gas mixtures

2005 Journal of Vacuum Science and Technology
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Porosity-induced effects during C4F8∕90% Ar plasma etching of silica-based ultralow-k dielectrics

2005 Journal of Vacuum Science & Technology B
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Studies of film deposition in fluorocarbon plasmas employing a small gap structure

2005 Journal of Vacuum Science and Technology
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Citations (36)