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Yong Ho Oh

Electronics and Telecommunications Research Institute

12

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23

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SUB-QUARTER MICRON LITHOGRAPHY : KrF EXCIMER LASER STEPPER WITH DUMMY DIFFRACTION MASK

1995 CAD | International Conference on VLSI and CAD
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Base-line error-free non-TTL alignment system using oblique illumination for wafer steppers

1995
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Zone-by-zone optimization of the dummy diffraction mask with auxiliary phase gratings

1994
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Photomask for forming t-shaped gate and producing method therefor

1994
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New mask technique for optical lithography--dummy diffraction mask

1993
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Neoclassical Transport Theory for finite Aspect Ratio in a Circular Flux Surface Tokamak

1989 Journal of the Korean Physical Society
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