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Norbert Schmidt
Norbert Schmidt
KLA-Tencor
Engineering
Mask inspection
Wafer
Photomask
Reticle
4
Papers
5
Citations
0
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Comparison of critical dimension measurementsof a mask inspection system with a CD-SEM
2012
Jan Heumann
Albrecht Ullrich
Clemens Utzny
Stefan Meusemann
Frank Kromer
John Whittey
Edgardo Garcia
Mark Wagner
Norbert Schmidt
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Results of new mask contamination inspection capability STARlight2+ 72nm pixel with cell-to-cell HiRes5 for qualifying memory masks in wafer fabs
2008
Raj Badoni
Jinggang Zhu
Russell Dover
Norbert Schmidt
Michael Lang
Andreas Jahnke
Florian Uhlig
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Results of new mask contamination inspection capability STARlight2+ 72nm pixel for qualifying memory masks in wafer fabs
2008
Russell Dover
Jinggang Zhu
Norbert Schmidt
Michael Lang
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Single pass die-to-database tritone reticle inspection capability
2006
Bryan Reese
Jan Heumann
Norbert Schmidt
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Citations (3)
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