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Om Nalamasu
Om Nalamasu
Alcatel-Lucent
Resist
Micrometre
Photochemistry
Acrylate
Optoelectronics
2
Papers
13
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Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imaging
2000
Journal of Vacuum Science & Technology B
Ebo H. Croffie
Lei Yuan
Mosong Cheng
Andrew R. Neureuther
F. M. Houlihan
Ray Cirelli
Pat G. Watson
Om Nalamasu
Allen H. Gabor
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Citations (12)
Advances in Resist Materials for 193 nm Lithography
1999
Journal of Photopolymer Science and Technology
Murrae J. Bowden
Allen H. Gabor
Ognian N. Dimov
Arturo N. Medina
Patrick Foster
Thomas Steinhausler
John J. Biafore
Gregory Spaziano
Sydney G. Slater
Andrew J. Blakeney
Mark Neisser
F. M. Houlihan
Ray Cirelli
Gary Dabbagh
Richard S. Hutton
Ilya L. Rushkin
James R. Sweeney
Allen G. Timko
Om Nalamasu
Elsa Reichmanis
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Citations (1)
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