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Akihiko Miura
Akihiko Miura
Hitachi
Copper
Copper interconnect
Electronic engineering
Stable process
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2
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Advanced Monitoring Method for Copper Interconnect Process ISSM Paper: PC-O-202
2007
Kensuke Ishikawa
Tomohiro Funakoshi
Akihiko Miura
Toshihiko Onozuka
Toshio Ando
Yasuo Imai
Hideo Ohta
Masami Ikota
Kenji Watanabe
Kazunori Nemoto
Hitachi High-Technologies
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Advanced monitoring method for copper interconnect process
2007
ISSM | International Symposium on Semiconductor Manufacturing
Kensuke Ishikawa
Toshio Ando
Masami Ikota
Tomohiro Funakoshi
Yasuo Imai
Kenji Watanabe
Akihiko Miura
Hideo Ohta
Kazunori Nemoto
Toshihiko Onozuka
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