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Srini Sundararajan
Srini Sundararajan
Plasma
Photoresist
Titanium nitride
Plasma etching
Composite material
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Footing reduction of positive deep-UV photoresists on plasma-enhanced ARL (PE ARL) SiON substrates
1998
Lori Anne Joesten
Matthew L. Moynihan
Tracy K. Lindsay
Michael T. Reilly
Kathy Konjuh
David Mordo
Kenneth P. Macwilliams
Srini Sundararajan
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