Old Web
English
Sign In
Acemap
>
authorDetail
>
M. Izawa
M. Izawa
Hitachi
Chemistry
Adsorption
Etching
Electronic engineering
Optoelectronics
5
Papers
17
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (4)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Ge FinFET CMOS Inverters with Improved Channel Surface Roughness by Using In-situ ALD Digital O 3 Treatment
2018
EDTM | IEEE Electron Devices Technology and Manufacturing Conference
M.-S. Yeh
G. L. Luo
F J Hou
P.-J. Sung
C.J. Wang
C J Su
C. T. Wu
Y. C. Huang
T.-C. Hong
Tien-Sheng Chao
B. Y. Chen
K. M. Chen
M. Izawa
M Miura
M. Morimoto
H. Ishimura
Y.-J Lee
W-F Wu
W K Yeh
Show All
Source
Cite
Save
Citations (4)
Hydrogen substitution of alcohol adsorbents on a Si surface by B2H6 deduced from molecular orbital calculation
1997
Applied Surface Science
M. Izawa
Yoshihisa Fujisaki
Show All
Source
Cite
Save
Citations (1)
An etching model to predict minimum-microloading gas pressure
1995
VLSIT | Symposium on VLSI Technology
M. Izawa
Takao Kumihashi
Yuzuru Ohji
Show All
Source
Cite
Save
Citations (1)
Calculation of the hyperfine splitting constants for the ground and excited states of NH2 radical
1992
Journal of Chemical Physics
H. Nakatsuji
M. Izawa
Show All
Source
Cite
Save
Citations (7)
1