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Matthew. P. Sagianis
Matthew. P. Sagianis
IBM
Hydrogen silsesquioxane
Etching
Plasma
Resist
Inductively coupled plasma
2
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5
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Process trace analytics for process development
2021
Robert J. Baseman
Fateh A. Tipu
Sebastian Engelmann
John M. Papalia
Matthew. P. Sagianis
Scott DeVries
Danielle Durrant
Sebastian Naczas
Vinay Pai
Shanti Pancharatnam
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Utilizing photosensitive polymers to evaluate UV radiation exposures in different plasma chamber configurations
2020
Journal of Vacuum Science and Technology
L. Buzi
Hiroyuki Miyazoe
Matthew. P. Sagianis
Nathan Marchack
John M. Papalia
Sebastian Engelmann
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Citations (5)
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