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Sean Corcoran

Intel

6

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41

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Effect of dopant profile on current-voltage characteristics of p+n+ In 0.53 Ga 0.47 As tunnel junctions

2009 ISDRS | International Semiconductor Device Research Symposium
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Nonmelt Laser Annealing of 5-KeV and 1-KeV

2002
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Nonmelt laser annealing of 5-KeV and 1-KeV boron-implanted silicon

2002 IEEE Transactions on Electron Devices
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Mapping two-dimensional arsenic distributions in silicon using dopant-selective chemical etching technique

1997 Journal of Applied Physics
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