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Etsuro Kawaguchi
Etsuro Kawaguchi
Lithography
Resist
Optics
Phase-shift mask
Optoelectronics
4
Papers
8
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Study of barrier coats for protection against airborne contamination in 157-nm lithography
2005
Francis M. Houlihan
Raj Sakamuri
Keino Hamilton
Alla Dimerli
David Rentkiewicz
Andrew Romano
Ralph R. Dammel
Yayi Wei
Nickolay Stepanenko
Michael Sebald
Christoph Hohle
Will Conley
Daniel Miller
Toshiro Itani
Masato Shigematsu
Etsuro Kawaguchi
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Citations (3)
Fabrication of 65-nm Holes for 157-nm Lithography
2004
Japanese Journal of Applied Physics
Etsuro Kawaguchi
Kunio Watanabe
Eiji Kurose
Takamitsu Furukawa
Toshiro Itani
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Citations (5)
Recent advances in fluorinated resists for application at 157 nm
2004
Francis M. Houlihan
Raj Sakamuri
Andrew Romano
David Rentkiewicz
Ralph R. Dammel
Will Conley
Daniel Miller
Michael Sebald
Nickolay Stepanenko
Matthias Markert
Uta Mierau
Inge Vermeir
Christoph Hohle
Toshiro Itani
Masato Shigematsu
Etsuro Kawaguchi
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Fabrication of 65 nm hole pattern in 157 nm lithography
2003
MNC | International Microprocesses and Nanotechnology Conference
Etsuro Kawaguchi
Kunio Watanabe
Eiji Kurose
Takamitsu Furukawa
Toshirn Itani
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